RESEARCH INSTITUTE OF PRECISION MACHINE MANUFACTURING
IZOPLAZ TM-1
Small-scale vacuum installation for plasma-chemical deposition of dielectric layers under reduced pressure
IZOPLAZ TM 1
Purpose:
Deposition of alloyed and unalloyed dielectric silicon oxide layers
and silicon nitride layers under reduced pressure
with plasma activation of reagents.
Special characteristics
Scheme
Group processing of 30 substrates up to Ø 100 mm;
Quartz reactor with temperature-controlled working area;