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MAGNA TM R

магна тм р_1

VACUUM INSTALLATION FOR FILM DEPOSITION ONTO ROLL MATERIAL BY MAGNETRON SPUTTERING

MAGNA TM R

Purpose:

Deposition of multicomponent and multilayer metal thin films onto roll material by magnetron sputtering.

магна тм р_2

ОСОБЕННОСТИ

СХЕМА УСТАНОВКИ

  • Several magnetron sputtering systems (2-4 pcs.);
  • Film deposition onto both sides of 60 -150 mm wide roll material in one technological cycle;
  • Preliminary heating and cleaning by ion source;
  • Oil-free (dry) pumping system (turbomolecular or cryogenic, forevacuum pumps);
  • Microprocessing control system;
  • Consumed power not more than 20 kW;
  • 6 m2 area per one plant.
magnar