VACUUM INSTALLATION FOR FILM DEPOSITION ONTO ROLL MATERIAL BY MAGNETRON SPUTTERING

MAGNA TM R

Purpose:

Deposition of multicomponent and multilayer metal thin films onto roll material by magnetron sputtering.

Special characteristics:

Scheme

• Several magnetron sputtering systems (2-4 pcs.);
• Film deposition onto both sides of 60 -150 mm wide roll material in one technological cycle;
• Preliminary heating and cleaning by ion source;
• Oil-free (dry) pumping system (turbomolecular or cryogenic, forevacuum pumps);
• Microprocessing control system;
• Consumed power not more than 20 kW;
• 6 m² area per one plant.