Small-scale vacuum installation for plasma-chemical film deposition from gas phase with diode system

MVU TM IZOPHAZE 01

Purpose:

Deposition of dielectric materials from gas phase with plasma activation in HF discharge.

Special characteristics

Scheme

• Table working surface – Ø 180 mm;
• Regulation and automatic control of HF power level within the range of 30-200 W;
• Substrate heating up to 400 °C;
• Forevacuum pumping system;
• Microprocessing control system;
• Consumed power not more than 3 kW;
• 2,5 m² area per one plant.