Small-scale vacuum installation for film deposition by magnetron sputtering and thermal evaporation

MVU TM MAGNA TIS 02

Purpose:

Deposition of metal films, resistive materials and dielectrics.

Special characteristics

 Scheme

• Magnetron sputtering device — 2 pcs.;
• Thermal evaporator — 1 pc.;
• Substrate processing in one technological cycle (single-sided processing): Ø 100 mm –4 pcs.;
• Periodical quarter-turn of substrate holder;
• Microprocessing control system;
• Oil-free pumping system (turbomolecular pumps 300 l/h);
• Consumed power not more than 4,5 kW;
• 2,5 m² area per one plant.