RESEARCH INSTITUTE OF PRECISION MACHINE MANUFACTURING
MVU TM MAGNA 01, 03, 06
Small – scale installation for film deposition by magnetron sputtering
MVU TM MAGNA 06
Purpose:
Deposition of metal films, resistive materials and dielectrics by magnetron sputtering.
Special characteristics:
Scheme
Type and quantity of magnetron sputtering device in the installation: magna 01, 06 – 1 of DC magnetron sputtering device, magna 03 — 1 pc of HF magnetron sputtering device;
Substrate processing in one technological cycle (single-sided processing): Ø 100 mm –4 pcs;
Periodical quarter-turn of substrate holder;
Microprocessing control system;
magna 01, 03 — oil-free pumping system (turbomolecular pumps 60 l/h);
magna 06 — oil-free pumping system (turbomolecular pumps 300 l/h);