Small – scale installation for film deposition by magnetron sputtering

MVU TM MAGNA 06

Purpose:

Deposition of metal films, resistive materials and dielectrics by magnetron sputtering.

Special characteristics:

Scheme

• Type and quantity of magnetron sputtering device in the installation: magna 01, 06 – 1 of DC magnetron sputtering device, magna 03 — 1 pc of HF magnetron sputtering device;
• Substrate processing in one technological cycle (single-sided processing): Ø 100 mm –4 pcs;
• Periodical quarter-turn of substrate holder;
• Microprocessing control system;
• magna 01, 03 — oil-free pumping system (turbomolecular pumps 60 l/h);
• magna 06 — oil-free pumping system (turbomolecular pumps 300 l/h);
• Consumed power not more than 4,5 kW;
• 2,5 m² area per one plant.