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MVU TM MAGNA 01, 03, 06

Small – scale installation for film deposition by magnetron sputtering

мву тм магна 01,03,06

Purpose:

Deposition of metal films, resistive materials and dielectrics by magnetron sputtering.

Special characteristics:

  • Type and quantity of magnetron sputtering device in the installation: magna 01, 06 – 1 of DC magnetron sputtering device, magna 03 — 1 pc of HF magnetron sputtering device;
  • Substrate processing in one technological cycle (single-sided processing): Ø 100 mm –4 pcs;
  • Periodical quarter-turn of substrate holder;
  • Microprocessing control system;
  • magna 01, 03 — oil-free pumping system (turbomolecular pumps 60 l/h);
  • magna 06 — oil-free pumping system (turbomolecular pumps 300 l/h);
  • Consumed power not more than 4,5 kW;
  • 2,5 m2 area per one plant.

    mvumagna136mvu tm magna 1.3.6 foto

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