Small-scale installation for film deposition by thermal evaporation
Purpose:
Film deposition by thermal evaporation.
Special characteristics:
- Substrate processing in one technological cycle (single-sided processing): Ø 100 mm – 4 pcs.;
- Microprocessing control system;
- Periodical quarter-turn of substrate holder;
- Oil-free pumping system (turbomolecular pumps 60 l/h);
- Consumed power not more than 4,5 kW;
- 2,5 m2 area per one plant.
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