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MONOOXID

Installation for obtaining high-purity materials and nanopowder synthesis in vacuum

монооксид-1

Purpose:

Realization of technological processes of high-purity materials obtaining such as high-temperature processing of materials and parts in vacuum, nanopowder synthesis, distillation and coating of materials.

Special characteristics:

  • Revolvable plasma reactor of Ø 130 mm;
  • HF heating up to 2100° C;
  • Reactor tilting and revolving system;
  • Oil-free (dry) pumping system (forevacuum and turbomolecular pumps);
  • Microprocessing control system;
  • Consumed power – 30 – 160 kW.

   monooxidмонооксид-3  

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