Desktop installation for film deposition by magnetron sputtering onto substrate
Purpose:
Deposition of metal films and resistive materials by magnetron sputtering.
Special characteristics:
- Substrate processing in one technological cycle: 60 x 48 mm –1 pc.;
- Microprocessing control system;
- Oil-free pumping system (turbomolecular pumps 60 l/h);
- Consumed power not more than 4,5 kW;
- 1,5 m2 area per one plant.
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