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NVU TM TIS 01

Desktop installation for film deposition by thermal evaporation

нву тм тис 01

Purpose:

Film deposition by thermal evaporation.

Special characteristics:

  • Substrate processing in one technological cycle (single-sided processing): 60 x 48 mm – 1 pc.;
  • Microprocessing control system;
  • Oil-free pumping system (turbomolecular pumps 60 l/h);
  • Consumed power not more than 4,5 kW;
  • 1,5 marea per one plant.

нву тм тис 01фото1        nvutis1

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