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OXID TM-1

Small-scale installation for the diffusion, oxidation and annealing of plates and materials at standard pressure

оксидтм1_1

Purpose:

Automatic thermal processing of plates and materials (diffusion, oxidation, annealing, diffusant rectification, reconstruction of crystalline structures) at standard pressure.

Special characteristics:

  • Group processing of 120 substrates up to Ø 100 mm;
  • Quartz reactor with pressure-proof working area;
  • Working temperature range 300 – 1100 °C;
  • Working gases –N2, O2, H2, HCl;
  • Microprocessing control system;
  • Consumed power not more than 15 kW;
  • The ability to embed into clean room;
  • 3 m2 area per one plant.

oxidtmоксидтм1_3  

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