Small-scale installation for the diffusion, oxidation and annealing of plates and materials at standard pressure

OXID TM 1

Purpose:

Automatic thermal processing of plates and materials (diffusion, oxidation, annealing, diffusant rectification, reconstruction of crystalline structures) at standard pressure.

Special characteristics

Scheme

• Group processing of 120 substrates up to Ø 100 mm;
• Quartz reactor with pressure-proof working area;
• Working temperature range 300 – 1100 °C;
• Working gases –N2, O2, H2, HCl;
• Microprocessing control system;
• Consumed power not more than 15 kW;
• The ability to embed into clean room;
• 3 m² area per one plant.