Small-scale installation for the diffusion, oxidation and annealing of plates and materials at standard pressure
Purpose:
Automatic thermal processing of plates and materials (diffusion, oxidation, annealing, diffusant rectification, reconstruction of crystalline structures) at standard pressure.
Special characteristics:
- Group processing of 120 substrates up to Ø 100 mm;
- Quartz reactor with pressure-proof working area;
- Working temperature range 300 – 1100 °C;
- Working gases –N2, O2, H2, HCl;
- Microprocessing control system;
- Consumed power not more than 15 kW;
- The ability to embed into clean room;
- 3 m2 area per one plant.
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