Small-scale installation for the diffusion, oxidation and annealing of plates and materials at standard pressure
Automatic thermal processing of plates and materials (diffusion, oxidation, annealing, diffusant rectification, reconstruction of crystalline structures) at standard pressure.
- Group processing of 120 substrates up to Ø 100 mm;
- Quartz reactor with pressure-proof working area;
- Working temperature range 300 – 1100 °C;
- Working gases –N2, O2, H2, HCl;
- Microprocessing control system;
- Consumed power not more than 15 kW;
- The ability to embed into clean room;
- 3 m2 area per one plant.