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OTJIG TM-4M

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Small-scale installation for thermal processing
of plates and materials in gas environment

OTJIG TM 4M

Purpose:

Automatic thermal processing of plates and materials (annealing, drying,
diffusant rectification, reconstruction of crystal structures)
at standard pressure in reducing or neutral environment.

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Special characteristics

Scheme

  • Group processing of 120 substrates up to Ø 100 mm;
  • Quartz reactor with sealed working area of 700 mm;
  • Working temperature range 300 – 1100 °C;
  • Working gases – Ar, O2, N2;
  • Microprocessing control system;
  • Consumed power not more than 15 kW;
  • The ability to embed into clean room;
  • 3 marea per one plant.
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