+7 (495) 229-7501    |    info@niitm.ru    |        |    RUS

OTJIG TM-4M

Small-scale installation for thermal processing of plates and materials in gas environment

отжигтм-4м_1

Purpose:

Automatic thermal processing of plates and materials (annealing, drying, diffusant rectification, reconstruction of crystal structures) at standard pressure in reducing or neutral environment.

Special characteristics:

  • Group processing of 120 substrates up to Ø 100 mm;
  • Quartz reactor with sealed working area of 700 mm;
  • Working temperature range 300 – 1100 °C;
  • Working gases – Ar, O2, N2;
  • Microprocessing control system;
  • Consumed power not more than 15 kW;
  • The ability to embed into clean room;
  • 3 marea per one plant.

     отжиг4м  

9c58e38e9870c3807495c61427c56ed5  Download PDF