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OTJIG TM-6

Small-scale installation for thermal processing of plates and materials in gas environment

отжигтм-6_1

Purpose:

Automatic thermal processing of silicon plates and materials in gas environment (annealing, drying, diffusant rectification, reconstruction of crystal structures) at standard pressure.

Special characteristics:

  • Quartz reactor with sealed working area;
  • Working temperature range 300 – 1100 °C;
  • Working gases – Ar, H2, N2;
  • Microprocessing control system;
  • Consumed power not more than 5 kW;
  • The ability to embed into clean room;
  • 1,5 m2 area per one plant.

отжигтм-6_3   отжиг6

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