+7 (495) 229-7501 |
RESEARCH INSTITUTE OF PRECISION MACHINE MANUFACTURING
ELIM ТМ 5
Four-position vacuum installation for film deposition by magnetron sputtering and electron-beam evaporation with load lock
ELIM TM 5
Deposition of metal films, resistive materials and dielectrics.
Group processing of substrates in one technological cycle: Ø 76 mm – 15 pcs., Ø 100 mm – 9 pcs., Ø 150 mm – 3 pcs.;
Lock-chambers for loading and unloading of substrates (Position 1);
Substrate transfer system from lock chamber to two work position (2, 3) by transport carrousel;
Multi-cathode magnetron sputtering device with three Ø 100 mm targets;
4-crucible electron-beam evaporators;
Preliminary substrate heating and cleaning by ion source;
Oil-free (dry) pumping system (turbomolecular or cryogenic, forevacuum pumps);
Microprocessing control system;
Consumed power not more than 20 kW;
area per one plant.
+7 (495) 229-7501
124460, Moscow, Zelenograd, Panfilovsky Pr., 10.
: Missing argument 2 for apply_filters(), called in /home/niitm/en.niitm.ru/docs/wp-content/themes/dante/footer.php on line 210 and defined in