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Vacuum equipment for plasma-chemical film deposition from gas
phase with ICP source (ICPPECVD)

FOR SERIAL PRODUCTION

IZOPHAZ TM 300 IZOPHAZ TM 200-01 IZOPHAZ TM 200-02 IZOPHAZ TM 200-01K IZOPHAZ 200-02K

FOR LOW PRODUCTION AND SCIENTIFIC RESEARCH

MVU TM IZOPHAZ 02