Vacuum installation for plasma-chemical film deposition from gas phase with ICP source and the load lock

IZOPHAZE TM 200-01

Purpose:

Atomic layer deposition of ultrathin films.  

Special characteristics

Scheme

• Group and individual treatment of substrates in one production cycle:
  60х48 mm – 7 pcs; Ø 76 mm – 4 pcs; 156х156 mm – 1 pcs;
  Ø 50 mm – 11 pcs; Ø 100 mm – 2 pcs; Ø 150, 200 mm – 1 pcs;
• Lock-chamber for loading and unloading substrates;
• Substrate transfer system from lock chamber to working chamber by manipulator;
• Reactor with a remote ICP plasma source;
• Substrate heating up to 400°C;  
• Deposition thermal mode and mode with a remote ICP plasma source;
• Ports to connect the vials with the precursor: with high vapor pressure – 2 pcs; low vapor pressure – 2 pcs (optional number of ports up to 4 pieces)
• Oil-free (dry) pumping system (forvacuum and turbomolecular pumps);
• Microprocessor control system;
• Power consumption is not more than 5 kWt;
• Ability to build in a clean room;
• 5m² area per plant.