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Vacuum equipment for reactive ion
etching with inductively coupled plasma source (ICPRIE)

FOR SERIAL PRODUCTION

 

 

плазмы-200

 

плазмы-200

 

плазмы-200

 

плазмы-200к

 

плазмы-200к

 

плазмы-200к

  PLASMA TM 5 PLASMA TM 200-01  PLASMA TM 200-02   PLASMA TM 200-03  PLASMA TM 200-01К   PLASMA TM 200-02К   PLASMA TM 200-03К 

FOR LOW PRODUCTION AND SCIENTIFIC RESEARCH

         
  MVU TM PLASMA 03   PLASMA TM 200