PROCESS SCHEME OF EQUIPMENT
VACUUM PLASMA EQUIPMENT
Film deposition
Dry processing of surface (PE)
Plasma-enchanced chemical vapour deposition (PECVD)
PHYSICAL AND THERMAL EQUIPMENT
Singal-crystal structure growing (Epitaxy)
Precision material cleaning
News
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Semicon — China 2016
23.03.16
«Research Institute of Presicion Machine Manufacturing» took part in the exhibition «Semicon — China 2016″….
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Latest news from the testing site
28.01.16
Silicon deep anisotropic etching at the depth of 100 micron with the hole diameter…
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«VacuumTechExpo 2016»
27.01.16
Dear guests, we inform you that we are participant of “VacuumTechExpo 2016” exhibition and…
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The trademark of JSC NIITM
26.01.16
JSC «Research Institute of Precision Machine Manufacturing» registered its trademark.
