CLUSTER TM-150 PVD
Creation of thin metal films by magnetron sputtering in vacuum on semiconductor wafers with a diameter of 150 mm. The installation ensures the creation of conformal metal films in windows with a large aspect ratio.
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Specifications:
Possibility of integration into a clean room
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Yes
Wafer diameter
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150mm
Wafer loading
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From cassette to cassette
Цена действительна только для интернет-магазина и может отличаться от цен в розничных магазинах
CLUSTER TM-150 PVD
Specifications:
- Wafer pre-cleaning system by thermal degassing;
- RF cleaning in the loadlock;
- Computer control system for wafers transport and technological modules;
- The uniformity of the obtained coatings up to ±3%;
- Increased target utilization due to the use of magnetrons with rotating MRU;
- Precise adjustment of the uniformity of the applied coatings by changing the configuration of the magnetic system, its rotation speed and other technological parameters;
- The maximum power consumption, not more than 60 kW;
- WxDxH, mm 2600×2500×2500
Warranty and post-warranty service;
The possibility of upgrading and reconfiguring equipment to meet customer requirements.