Cluster TM-150
Creation of thin metal films by magnetron sputtering in vacuum on semiconductor wafers with a diameter of 150 mm. The installation ensures the creation of conformal metal films in windows with a large aspect ratio.
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Specifications:
Possibility of integration into a clean room
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Yes
Wafer diameter
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150mm
Wafer loading
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SMIF container
Цена действительна только для интернет-магазина и может отличаться от цен в розничных магазинах
Cluster TM-150
Technical Specifications:
- Plate pre-cleaning system by thermal degassing;
- RF cleaning in the download gateway;
- Computer control system for plate transport and technological modules;
- The uniformity of the obtained coatings is up to ±3%;
- Increased target utilization due to the use of magnetrons with rotating MRU;
- Precise adjustment of the uniformity of the applied coatings by changing the configuration of the magnetic system, its rotation speed and other technological parameters;
- The maximum power consumption is not more than 60 kW;
- WxDxH - 2600×2500×2500
Warranty and post-warranty service;
The possibility of upgrading and reconfiguring equipment to meet customer requirements.